Thin-film devices
The development of thin-film materials is a major research focus. This type of shaping takes advantage of the combined properties of the substrate (glass, polymers, microelectronic substrate, etc.) and various materials that can be deposited in layers, with surface structuring if required. These materials provide passive, active (modulable by the action of an external stimulus) or even intelligent (the compound adapts spontaneously to an external stimulus) functional properties. The department's research focuses in particular on methodological aspects of developing materials with original properties, with particular emphasis on microstructures in the nanometric range. A number of these topics are addressed in an industrial context or in conjunction with IP Paris' interdisciplinary centers.
1. Functional thin films based on alkali silicates or hybrids
2. Coloured or luminescent thin films produced by laser treatment
3. Ultra-hard thin films based on covalent compounds
4. Optoelectronic devices in thin films based on semiconductor nanocrystals
5. Thin films based on plasmonic oxides for infrared solar control
6. Assembly of nanocrystals for the study and implementation of collective effects
7. Functional π-conjugated (supra)molecular architectures for (opto)electronics
8. Sequential layer-by-layer deposition
9. Thin MOF layers
Faculty contacts
| Clémence Badie (subject 8) | Simon Delacroix (subjects 2 and 3) |
| Thierry Gacoin (subjects 1 and 5) | Catherine Henry de Villeneuve (subject 9) |
| Clément Livache (subjects 4 and 6) | Jong Wook Kim (subjects 5 and 6) |
| Michel Rosso (subject 9) | Abderrahim Yassar (subject 7) |
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